This is the first practical ALD book which goes extensively into applications as well as the foundations of theory, including fundamental aspects such as films and materials.
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications is a new edition of Atomic Layer Deposition for Nanotechnology, authored by Arthur Sherman and published in 2008. The new edition has been thoroughly updated to cover new developments in process configuration, such as roll-to-roll manufacturing, and has been extended to highlight industrial applications.
ALD technology is being adopted by manufacturers all over the world, making Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications an indispensable title. ALD has become of paramount importance in a number of applications in recent years. This is particularly true for microelectronics and MEMS devices because of the economic pressure driving devices to ever smaller dimensions. Non-microelectronics applications, where the characteristic uniformity and conformality properties of ALD are prized, have gained great potential as well. In particular, emerging industrial applications such as organic and flexible electronics, solar cells, optical coatings, silver tarnish prevention, coating catalytic membranes, and solid fuel cells are the most notable.
Readership
Scientists and engineers in diverse fields of chemistry, materials science and physics who develop the ultra-thin film deposition processes and manufacturing technology facilitating industrial applications. Atomic Layer Deposition is highly suitable for use in training in the industrial setting as well as for a graduate-level course in atomic layer deposition.
